Dr. Pravarthana Dhanapal

Assistant Professor

211 (c), HUB Building
Email: dpravarthana[at]iiti.ac.in
Phone: +91 0731 660 33xx

Group Website

Research Interests

  • All-Solid-State-Ionic Device structure for Magneto-Ionics.
  • Interfacial Engineering of Magnetic Domains in Metallic/Metal Oxide Multilayers.
  • Functional thin films for device applications.
  • High-Throughput Synthesis and Characterizations of Epitaxial Metal Oxide Heterostructures.
  • Epitaxial Metal Oxide Heterostructures Processing-Structure-Property- Interrelationships.

Selected Publications

  • D. Pravarthana,* Jiafeng Wei, Baomin Wang, Fan Luo, Huali Yang, Shanshan Guo, Zeeshan Mustafa, Wilfrid Prellier, and Run-Wei Li. “Crystal Orientations Dependent Polarization Reversal in Ferroelectric PbZr0.2Ti0.8O3 Thin Films for Multilevel Data Storage Applications”  Advanced Materials Interfaces 2100871 (2021)  
  • Nagmani, D. Pravarthana*, A. Tyagi, T. Jagadale, W. Prellier, and D. Aswal “Highly Sensitive and Selective H2S Gas Sensor Based on TiO2 Thin Films” Appl. Surf. Sci. 549, 149281 (2021)
  • D. Pravarthana, Baomin Wang, Zeeshan  Mustafa, Sandeep Agarwal, Ke Pei, Yang Huali, and Run-Wei Li. “Reversible Control of Magnetic Anisotropy and Magnetization in Amorphous Co40Fe40B20 thin films via All-Solid-State Li-ion Redox Capacitor” Phys. Rev. Appl. 2019, 12, 054065 (2019)
  • D. Pravarthana*, O. I. Lebedev, A. David, A. Fouchet, M. Trassin, G. S. Rohrer, P. A. Salvador and W. Prellier “Metastable monoclinic [110] layered perovskite Dy2Ti2O7 thin films for ferroelectric applications” RSC Adv. 9, 19895-19904, (2019)
  • D. Pravarthana, Zhang Tuo, Baomin Wang, Yang Huali, Haicheng Xuan, Chong Bi, Weigang Wang, and Run-Wei Li “Reversibly controlled magnetic domains of Co film via electric field driven oxygen migration at nanoscale” Appl. Phys. Lett. 114, 232401 (2019)
  • D.Pravarthana, M.Trassin, J.H Chu, M.Lacotte, A.David, R. Ramesh, P.A Salvador, W.Prellier “BiFeO3/La0.7Sr0.3MnO3 heterostructures deposited on spark plasma sintered  LaAlO3 substrates”, Appl. Phys. Lett.  104, 082914 (2014).